Company Highlights Leadership in Driving Next Era of EUV Lithography
FREMONT, Calif., June 14, 2022 /PRNewswire/ — Lam Research (Nasdaq: LRCX) today announced that SK hynix Inc. has selected Lam’s innovative dry resin fabrication technology as the benchmark development tool for two key steps in the chip production process Advanced DRAMs. A breakthrough technology introduced by Lam in 2020, dry resin extends the resolution, productivity and throughput of extreme ultraviolet (EUV) lithography, an essential technology used in the production of next-generation semiconductors.
Lam Research announces that SK hynix has chosen an innovative dry resistor technology for the production of advanced DRAM chips.
Through Lam’s work with SK hynix and continued collaboration with ecosystem partners on dry-resist technology, the company continues to play a leadership role in driving modeling innovations to remove associated barriers. to scaling future memory nodes with EUV lithography.
“Lam’s dry resistance technology is a game changer. By innovating at the materials level, it solves the toughest challenges in EUV lithography, enabling cost-effective scaling for advanced memory and logic,” said Richard Wise, vice president and general manager of dry resist. . product group at Lam. “We are proud to continue our longstanding collaboration with SK hynix to accelerate DRAM technology innovations.”
SK hynix intends to use Lam’s dry resist underlay and dry development processes for advanced DRAM patterning. “As DRAM continues to evolve, innovations in EUV modeling are critical to delivering the performance needed by today’s increasingly connected devices at a cost that our customers can afford,” said BK Lee, responsible for the R&D process at SK hynix. “The dry resist technology we’re working on with Lam allows for exceptionally precise, low-defect, low-cost patterning.”
As chipmakers move toward advanced technology nodes, they must solve ever smaller and thinner chip designs on the wafer. First developed by Lam in collaboration with ASML and IMEC, dry resist technology offers several advantages over conventional chemically amplified resist patterning for EUV lithography. Dry resist technology solutions dramatically improve EUV sensitivity and resolution of each wafer pass, allowing patterns to better adhere to the wafer and improving performance and yield. Additionally, Lam’s dry resin development approach provides key sustainability benefits by consuming less energy and five to ten times less raw materials than traditional wet strength chemical processes.
Additional media resource: Why new photoresist technology is essential
About Lam Research
Lam Research Corporation (NASDAQ: LRCX) is a global provider of innovative wafer fabrication equipment and services for the semiconductor industry. Lam’s equipment and services enable customers to build smaller, more capable devices. In fact, almost all advanced chips today are built with Lam technology. We combine superior systems engineering, technology leadership and a strong values-based culture with an unwavering commitment to our customers. Lam Research is a FORTUNE 500® company headquartered in Fremont, California, with operations around the world. Learn more at www.lamresearch.com (LRCX-P).
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SOURCE Lam Research Society